Determining the Deposition Rate of Semiconducting Intrinsic Layer Prepared by Nanospray Method

Amorphous carbon ( a -C) film provides potential ability as an i-type layer in semiconductor material for photovoltaic purposes due to its tunable properties. Here, we investigate how get the deposition rate estimation of thickness and homogenous surface -C solar cell applications. The was prepared from palmyra liquid sugar using nebulizer nanospray method. thick carbonized at 250◦C 2.5 hours then continued 300◦C 2 obtain high-carbon charcoal. examined SEM cross section, amorphous phase measured XRD. characteristic is confirmed by broad peaks XRD patterns. films found be thinner than previous study that used similar materials methods but different equipment process. average range 200 450 nm, followed increase time 5 25 s. By these value, obtained extrapolation linier method result around 11.62 nm/s. This can reference make various thicknesses i-layer order find maximum gives high efficiency film.